Program at a Glance

| 1st Day | Aug. 10.(Mon)
07:30-08:20
Registration
08:20-09:50
[PL1] Plenary Session 1 『Room 405 - 408』
Chair: 차병철 (Entegris)
Opening Remarks학술대회 개회사
  • (Organizing Committee Chair) Byoung Ho Lee, (OSK President) Donghyun Kim
  • Plenary Talk 1-1 Sarohan Park (SK hynix)
  • Plenary Talk 1-2 Jin Seok Heo (KLA)
09:50-10:10
Break
10:10-11:50
[SP1] Scientific Program 1 『Room 405 - 408』
Optical & EUV Lithography
Chair: 이상설 (포스텍), 김상진 (아주대)
  • OP & EUV 1. (Invited) Ted Liang (LASERTEC)
  • OP & EUV 2. (Invited) Brandon Holybee (xLight)
  • OP & EUV 3. (Invited) Sungmin Huh (ASML Korea)
  • OP & EUV 4. (Invited) Jeonghoon Lee (IMEC)
11:50-13:20
  • Lunch / Break
  • Nano Bridge: Student Mentoring Program 『Room TBD』
13:20-15:10
[SP2] Scientific Program 2 『Room 405 - 408』
Metrology & Inspection
Chair: 김욱래 (삼성전자)
  • MI 1. (Invited) Tianhan Wang (KLA)
  • MI 2. (Invited) Sylvia Lewis (Sigray)
  • MI 3. (Invited) Byungkyu Cha (Samsung Electronics)
  • MI 4. (Invited) Soyeon Chang (Seoul National Univ.)
15:10-15:30
Break
15:30-17:00
[PL2] Plenary Session 2 『Room 405-408』
Chair: 김병국 (ESOL)
  • Plenary Talk 2-1 Jason Kim (Applied Materials)
  • Plenary Talk 2-2 Keun Hee Bai (Samsung Electronics)
17:00-18:00
[SP3] Scientific Program 3 『Room 405 - 408』
Dry Etch
Chair: 염근영 (성균관대), 김용진 (전북대)
  • Etch 1. (Invited) Kwang-Ho Kwon (Korea Univ.)
  • Etch 2. (Invited) Doo Young Lee (AMAT)
  • Etch 3. (Invited) Heeyeop CHAE (Sungkyunkwan Univ.)
18:00-20:00
Poster Session 『Room 401 - 402』
Poster Presentation + Industrial Contribution (Networking Reception)
만찬, 만찬, Conference Dinner
| 2nd Day | Aug. 11. (Tue)
07:30-08:20
Registration
08:20-09:50
[PL3] Plenary Session 3 『Room 405 - 408』
Chair: 이상설 (포스텍)
Welcome Session조직위원장, 프로그램위원장
  • Plenary Talk 3-1 Vivek Bakshi (EUV Litho)
  • Plenary Talk 3-2 Chang Min Park (Samsung Electronics)
09:50-10:10
Break
10:10-10:40
Student Speed Talk
Chair: 김성환 (한양대)
10:40-11:40
[SP4] Scientific Program 4 『Room 405 - 408』
Computational Lithography
Chair: 양승훈 (삼성전자)
  • CL 1. (Invited) Bongkeun Kim (Samsung Electronics)
  • CL 2. (Invited) Wan Ho Kim (Siemens EDA)
  • CL 3. (Oral) Seohyun Kim (KAIST)
11:40-13:00
Lunch / Break
13:00-14:40
[SP5] Scientific Program 5 『Room 405 - 408』
Joint session Alternative Lithogrpahy + EUV & MI
Chair: 김명기 (고려대), 이상설 (포스텍)
  • AL 1. (Invited) Sunghwan Kim (Hanyang Univ.)
  • OP & EUV + AL 2. (Invited) Philip KS Kim (LG Electronics)
  • OP & EUV 5. (Invited) Jiho Kim (PAL)
  • MI 5. (Invited) Junho Yoo (Nexensor)
  • AL 3. (Invited) You Shin No (Konkuk Univ.)
14:40-14:50
Break
14:50-16:55
Special Program 『Room 405 - 408』
NGL Japan Session
Chair: 차병철 (Entegris)
  • NGL-J 1. (Invited) Satoshi Enomoto (Toyo Gosei)
  • NGL-J 2. (Invited) Takaharu Nagai (DNP)
  • NGL-J 3. (Invited) Daijiro Akagi (AGC)
  • NGL-J 4. (Invited) Isao Ichikawa (Lintec)
  • NGL-J 5. (Invited) Norifumi Hosoi (Tekscend Photomask) _ On-line
16:55-17:10
Break
17:10-18:30
[SP6] Scientific Program 6 『Room 405 - 408』
Patterning Materials
  • PM 1. (Invited) Roberto Fallica (IMEC) _ On-line
  • PM 2. (Invited) Ji-Hyun Jang (UNIST)
  • PM 3. (Invited) Hyeok Yun (KRISS)
  • PM 4. (Invited) Gayoung Kim (Inha Univ.)
18:30-18:40
Closing Session 『Room 405 - 408』
Best Student Paper Award Ceremony
Closing Remark

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