Welcome to the 2026 Next Generation Lithography + Patterning Conference!

Dear Colleagues,

The NGL 2026 Conference, to be held on August 10–11, 2026 at the Suwon Convention Center, will bring together the global lithography and semiconductor community to explore the latest advances in next-generation patterning technologies.

Under the slogan “Lithography Powering the Next Wave of AI Technologies,” this conference aims to highlight the critical role of lithography in enabling future semiconductor innovations driven by artificial intelligence, high-performance computing, and advanced memory technologies.

The program will emphasize the increasing maturity and adoption of EUV lithography in high-volume manufacturing, while also addressing emerging challenges and opportunities associated with 0.55-NA (High-NA) EUV systems. Particular attention will be given to key technical barriers such as resist stochastics, next-generation mask technologies, defectivity control, and infrastructure readiness.

In addition, the conference will cover a broad spectrum of lithography and patterning technologies, fostering collaboration across industry, academia, and research institutes. Special sessions will include strategic collaboration with NGL Japan and focused discussions on advanced etch technology for nanopatterning.

Warm regards,

Conference Chair Jun-Ho Lee (Kongju Uni.), Byoung-Ho Lee (Park Systems)
Program Chair Sangsul Lee (POSTECH), Byungcheol Cha (Entegris)